Bandwidth Foundry is developing a novel 2-dimensional interferometric lithography (2DIL) manufacturing technology platform for the high-speed writing of super-fine structures onto a diversity of large substrates ranging from 12" wafers to 1 m2 panels, with the materials ranging from silica to curable sol-gel polymers.
2DIL is a unique process based on multiple beam interference which will overcome the resolution and phase noise limitations of traditional mask lithography. It will outperform commonly used scanning laser methods and electron beam lithography in terms of the combination of writing speed, feature size and pattern precision. The 2DIL platform can be used in a number of diverse applications such as:
- Patterning of photonic band gap (PBG) materials;
- 2D phase masks;
- Photomasks for flat panel display (FPD) manufacturing.
