At Bandwidth Foundry International we make
photomasks for semiconductor, MEMS, microfluidics, astrophysics and photonics
industries as well as research and other applications using a state-of-the-art
Heidelberg DWL200 laser writer. Some typical
applications of our masks are printing on mask aligners or 1:1 project
aligners. We manufacture these
structured photomasks from your design according to your specifications. Our team is committed to delivering a high
quality product with a fast turn-around and our pricing is highly
competitive. Our pricing model takes
into account the writing area, the required resolution, the blank photomask
quality and required turn around time. For a quote please talk to us with your
specific requirements. [Request a quote]
Minimum Critical Dimension
Standard - features down to 2.5
micron
High - features down to 1 micron
Ultra-High – features down
to 500 nm
Minimum Tolerance +/- 100 nm
Best Writing Grid 15 nm
Relative alignment better than 300 nm
Maximum blank size 7.25”
Single write or step & repeat
CAD design assistance
Heidelberg DWL 200 Laser writer
Heidelberg DWL 200 Laser writer
MEMS Devices
BFI Photomask
Stock items and Substrates
3” square 0.06” thick Soda Lime only
4” square 0.06” thick low, or high reflective
Chrome Quartz, and Soda Lime
5” square 0.09” thick low, or high reflective
Chrome Quartz, and Soda Lime
6” square 0.09” thick Quartz and Soda Lime
7” square 0.12 thick Quartz and Soda Lime
Other substrates available upon request. However, general limitations are maximum size
200 mm square and maximum 6 mm thick.
